Novel Classes of Cyclic Olefin Polymers for 193nm Lithography
نویسندگان
چکیده
منابع مشابه
25nm Immersion Lithography at a 193nm Wavelength
The physical limitations of lithographic imaging are ultimately imposed by the refractive indices of the materials involved. At oblique collection angles, the numerical aperture of an optical system is determined by nsin(θ) , where n is the lowest material refractive index (in the absence of any refractive power through curvature). For 193nm water immersion lithography, the fluid is the limitin...
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For the next-generation immersion lithography technology, there is a growing interest in the immersion fluids having a refractive index larger than 1.5 and low absorbance at 193nm wavelength. In this paper, we report our effort in identifying new immersion fluid candidates. The absolute refractive index values and thermo-optic coefficients, dn/dT, were measured with 1x10 and 1x10 accuracy respe...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2001
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.14.385